Reticle Defect
Management System

RDMS is a fully integrated defect management and
automated defect classification system. It is ideal for

- Monitoring defect growth on reticles in mask and wafer  fabs
- Automated
heuristic defect classification
Increase inspection tool utilization
- Track defect repair
history with user annotated comments
- Provide defect and reference
images to engineers and technicians
Statistical data mining
- Share inspection data & images with
customers (and end users)
- Monitor inspection tool
- Root cause analysis
- Monitor
process health
Progressive defect  trending
- Compare mask inspection results across
    - different tools
    - different  vendors and
    - different geographical locations (from fabs in different cities)
- Control with multi teared user access
- Receive
automated messages and reports
Much much more...

RDMS is an enterprise class highly compact mask inspection defect
management framework for the Mask and Wafer fabrication plant

Information is ‘key’. Timely information in a fab environment provides
substantial insight into the Mask quality, process health, steps needed to
improve yield and throughout time. Ideal for mask and wafer fabs, the
RDMS central server brings the inspection tool’s terminal to the end user
via a desktop application. Hundreds of users can simultaneously classify,
annotate repair history, query and summarize year’s worth of inspection
results with images from tens of tools, as well as establish defect  and
process health trends in a matter of seconds.
 Fabs can now monitor
defect growth across masks, and perform progressive defect growth
& commonality studies. RDMS tracks every defect from every
inspection of every mask in every fab at any time.
The RDMS a low cost,
state of the art mask defect management framework delivering a highly
integrated rich user experience, can fit in as little as a compact rack
mountable server system.

What does it do?

With the RDMS users can manually and automatically classify defects
thus improving the tool’s utilization while also allowing a means
to easily double check already classified defects
. Both transmitted and
reflected light defect dispositioning is supported. Repair engineers can
annotate comments on every repaired and dispositioned defect in the
mask shop. Provisions exist in the software to overlay and compare
defects co-ordinates in repeated inspections of the same mask.

Mask shops can share inspection results with the end customers by
shipping binary records, with classification, repair histories and defect
images with their customer thus improving manufacturing transparency.

Process engineers can establish defect trends, quantify state of the
manufacturing process and compute yield. Inspection engineers can
summaries aggregate results, and monitor the performance and the
health of an inspection tool.

Overall the RDMS provides a robust means to track reticles throughout
the entire life cycle. The RDMS is capable of mimicking the inspection
tools terminal on a users desktop via a client application. It essentially
brings the inspection tools terminal to any user on the network.

RDMS Server

The system features a redundant array of disks to guard against disk
failure, redundant power supplies, redundant processors (optional),
redundant network cards, and a host of other robustness features to
ensure an extremely high uptime.

In its most compact form the RDMS comes in a 1U form factor measuring
less than 2 inches in thickness, though higher capacity models are
available. The most compact version of the system can comfortably
archive hundreds of thousand inspection reports and can serve a
medium size factory without the need to ever delete inspection reports for
several years. However note, that the actual number of inspection reports
archived depends on the average number of defects picked up by the
inspection system and the size and quantities of images generated.

For redundancy a separate RDMS can be configured to mirror the primary
system, or perform a complete backup on a daily basis. This backup
RDM is always powered ON and will act as a hot standby, should the
primary system ever fail.

Client App

User’s connect with the RDMS server
via a client application installed locally.
The client application can simultaneously
render multiple inspections records with
images. The client application is able to
access inspection records from either a
central database hosted on the
RDMS, for which a valid user account
is required, or directly from the inspection
record’s source files saved by the inspection system itself. Database
access from the client is extremely fast, rivaling speeds of a good search

In the client application the user is able to pick and choose which images
appear where in the interface. The images can also be manipulated,
such as zoomed, scrolled, differenced, aligned, enhanced and viewed in
pseudo colors.

Via the client application, a user can manually and automatically classify
defects, add any number of comments to defects, overlay defect co-
ordinates from multiple inspections, compute yield, summaries
aggregate inspection results, etc. The system features multi-level
access, where by users are granted four different levels of access. These
are “read-only”, “annotate-comments”,  “classify” and “administrator”.

The RDMS is a turn key-system. Our team  will deploy a fully configured
hardware software plat form in you data center right out of the box. All you
have to do is attach it to the power & network, and perform minor
Software for Nanotechnology
Reticle Defect Management
System (RDMS)
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"An Enterprise class defect
management, analysis and
yield enhancement  
framework for the entire
Reticle life-cycle geared for
Semiconductor Mask and
Wafer Fabs"
MaskShop is a registered
trademark of Reticle Labs. All
other trademarks are the property
of their respective owners.
MaskShop v3.0 Released
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Free Evaluation for Fabs
Yes! We also develop
custom software for Mask
& Wafer fabs
+1 (408) 390-0986